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HTA Photomask produces quality masks and other products for our
customers from many data sources and engineering inputs:
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1. Finished Artwork |
HTA has the capability to camera reduce your rubylith artwork and photoplotted films to provide complete flexibility in the maskmaking process.
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2. Engineering Drawing |
HTA can digitize circuit patterns or devices from your dimensioned drawings. From this data we provide plots for your final approval before the mask making process begins.
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3. Gerber Data
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HTA has developed several mask making options with the use of Gerber data. These
options allow us to generate high precision masks with critical dimensions
to 2 microns and step and repeat accuracy of less than 1 micron across a
large array. Using Gerber data HTA has great flexibility in generating
masks for thin film microwave circuits, as well as masks with large die sizes.
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4. AutoCAD.dxf
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Image patterns created by drafting software must be digitized to produce a finished mask.
HTA can do this for you. Thereare several easy rules to follow depending
on the end mask requirements. HTA can work from any DXF drawing interface
file, especially if it is from AutoCAD. If it is not true AutoCAD, but a
close facsimile, we will likely be able to use it.
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5. Calma Stream GDSII
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This CAD format has been in use for many years. HTA can work from this format as long as
all data meets Calma specifications, and it is alphanumeric with positive
whole integers.
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HTA
employs several manufacturing methods so our customers can select the
fastest, most cost-effective way to generate high quality
photomasks..
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