Photomask
photomask in electronics
photomask information

The Photomask is a high resolution precision flat glass substrate with micro photographic images of electronic circuits, micro-electronic circuitry, electronic packaging designs, semiconductor designs, and is used to image electronic substrates such as silicon wafers, ceramic substrates, and other micro chip materials. Other industries that use the Photomask is the Precision Optics industry. The photomask is used to pattern fresnel lenses, optical apertures, linear and rotary scales, measurement standards, apodizing filters, special effects photographic filters and many other components. The Photomask can be manufactured on flat quartz substrates such as fused silica polished to a flatness of sub micron flatness over a large area. Other substrates such as soda lime glass, filter glass, pyrex and borosilicate is also used to make photomasks. Methods to image or pattern the photomask are to expose it with optical equipment and optical materials such as photoresist that is sensitive in the optical wavelengths of light. Ultraviolet light is the most popular wavelengths of light that are use to image the photomask. Electron Beam imaging and Laser writing equipment is also use to pattern the photomask. All of these techniques are available at HTA Photomask.