1605 Remuda Lane, San Jose, CA 95112

Working Mask

Photomask – A design or Pattern of Photographically produced actinically opaque images used in Microlithography. These images may be on various films or glass substrates and the images may be made of various materials and of various sizes.

HTA Photomask manufactures 1x mask. The two most common type of substrate material used for making photomasks are soda lime and fused silica. And the two most common type of metallization coating are chrome and iron oxide. The size of the plate ranges from three inches to nine inches and the thickness also varies.

Below is a common specification for a mask.
A Specification
Minimum Feature ≥ 5 um
Critical Dimension Tolerance +/- 0.50um
Registration, guaranteed of system +/- 0.50um
Defect Control, manual inspection 1 DPSI @ 3.0um
B Specification
Minimum Feature ≥ 2.5 um
Critical Dimension Tolerance +/- 0.25um
Registration, guaranteed of system +/- 0.25um
Defect Control, manual inspection 1 DPSI @ 2.0um
C Specification
Minimum Feature ≥ 1 um
Critical Dimension Tolerance +/- 0.15um
Registration, guaranteed of system +/- 0.25um
Defect Control, manual inspection 1 DPSI @ 2.0um

HTA Photomask Produces High Quality Masks for:

Electronics
Bump Mask
Field Effect Transistors
Hybrid Circuits
Lead Frames
Micomodules
Precision PC Boards
Probe Cards
Reticles
Semiconductors
Thin Film Circuits
Display
Flat Panel Displays
Liquid Crystal Displays
Optical Products
Encoders
Fresnel Lenses
Inspection Grids
Laser Masks
Laser Scales
Optical Filters
Optical Wave Guides
Resolution Targets
Special Effects Filters
Stage Micrometers
Other
Hard Disk Imaging
Medical Products
Metal Etched Parts
Micromachining
Microchip Recorders
Surface Acoustic Waveguides
Telecommunications
Nanotech
Mems
Biotechnology